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2015 | 13 | 1 |
Tytuł artykułu

Properties of atmospheric pressure plasma oxidized layers on silicon wafers

Treść / Zawartość
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
In this research a new process of plasma oxidation of crystalline silicon at room temperature is studied. The plasma oxidation was carried out using Diffuse Coplanar Surface Barrier Discharge (DCSBD) operating in ambient air and oxygen at atmospheric pressure. The influence of exposition time, plasma parameters and crystallographic orientation of silicon on oxidized layers and their dielectric properties were investigated. Thickness, structure and morphology of these layers were studied by ellipsometry, infrared absorption spectroscopy and scanning electron microscopy. During the treatment time, from 1 to 30 minutes, oxidized layers were obtained with thickness from 1 to 10 nm. Their roughness depends on the crystallographic orientation of silicon surface and exposure time. Electrical parameters of the prepared layers indicate the presence of an intermediate layer between silicon substrate and the oxidized layer.
EN
Wydawca

Czasopismo
Rocznik
Tom
13
Numer
1
Opis fizyczny
Daty
otrzymano
2014-01-31
zaakceptowano
2014-05-08
online
2014-11-26
Twórcy
  • Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic
autor
  • Department of Physics, Faculty of Education, Masaryk University, Poříčí 7, 603 00, Brno, Czech Republic
  • Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic
  • Department of Physics, Faculty of Education, Masaryk University, Poříčí 7, 603 00, Brno, Czech Republic
  • Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic
  • Institute of Physics, University of Greifswald, Felix-Hausdorff-Strasse 6, 17487, Greifswald, Germany
  • Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic
Bibliografia
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Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.-psjd-doi-10_1515_chem-2015-0047
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