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2015 | 13 | 1 |
Tytuł artykułu

Deposition of Zn-containing films using atmospheric pressure plasma jet

Treść / Zawartość
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
The purpose of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09.” In preliminary experiments Zn-containing films were deposited on the silicon substrates immersed in water solutions of Zn(NO3)2•6H2O salt. The surface composition of deposited films was analyzed by the XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have determined that the concentration of the zinc nitrate solution as well as changes in the deposition time resulted in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed.
EN
Wydawca
Czasopismo
Rocznik
Tom
13
Numer
1
Opis fizyczny
Daty
otrzymano
2014-01-30
zaakceptowano
2014-05-14
online
2014-11-17
Twórcy
  • Dept. of Physical Electronics, Masaryk University, 61137 Brno, Czech Republic
autor
  • University of Greifswald, Institute of Physics, 17489 Greifswald, Germany
  • Institute of Experimental and Applied Physics, Christian-Albrechts-Universitat zu Kiel, 24098 Kiel, Germany
  • Dept. of Physical Electronics, Masaryk University, 61137 Brno, Czech Republic
autor
  • Dept. of Physical Electronics, Masaryk University, 61137 Brno, Czech Republic
Bibliografia
  • [1] Schütze A. et al., IEEE Trans. Plasma Sci., 1998, 26(6), 1685[Crossref]
  • [2] Kunhardt E.E., IEEE Trans. Plasma Sci., 2000, 28(1), 189[Crossref]
  • [3] Laroussi M., IEEE Trans. Plasma Sci., 2002, 30(4), 1409[Crossref]
  • [4] Duan Y.et al., IEEE Trans. Plasma Sci., 2005, 33 (2), 328[Crossref]
  • [5] Yu Q.S. et al., Appl. Phys. Lett., 2006, 88(1), 013903[Crossref]
  • [6] Cheng C.et al., Surface & Coatings Technology, 2006, 200, 6659
  • [7] Noeske M. et al., International Journal of Adhesion and Adhesives, 2004, 24, 171[Crossref]
  • [8] Gweon B. et al., Appl. Phys. Lett., 2010, 96, 101501
  • [9] Tendero C. et al., Spectrochim. Acta B, 2006, 61, 2
  • [10] Benedikt J. et al., Appl. Phys. Lett., 2006, 89(25), 251504[Crossref]
  • [11] Duan Y. et al., Rev. Sci. Instrum., 2007, 78(1), 015104[Crossref]
  • [12] Han M.H. et al., Plasma Process. Polym., 2008, 5(9), 861[Crossref]
  • [13] Bornholdt S. et al., Eur. Phys. J. D, 2010, 60, 653
  • [14] Yang S.-H. et al., Thin Solid Films, 2009, 517, 5284
  • [15] Schafer J. et al., J. Phys. D: Appl. Phys., 2008, 41, 194010
  • [16] Schafer J. et al., Eur. Phys. J. D, 2009, 54, 211[Crossref]
  • [17] Ha H.-K. et al., Appl. Phys. Lett., 1996, 68(21), 2965[Crossref]
  • [18] Maruyama K. et al., J. Mater. Sci. Lett., 2001, 20(5), 481[Crossref]
  • [19] Penkov O.V. et al., Thin Solid Films, 2010, 518(22), 6160[Crossref]
  • [20] Suzaki Y. et al., Thin Solid Films, 2006, 506–507, 155
  • [21] Kim D.H. et al., J. Electrochem. Soc., 2007, 154(11), H939
  • [22] Yamada T. et al., Appl.Phys. Lett., 2007, 91(5), 051915[Crossref]
  • [23] Ramamoorthy K. et al., Opt. Commun., 2006, 262(1), 91
  • [24] Bhosle V.et al., J. Appl. Phys., 2006, 100(3), 033713[Crossref]
  • [25] Volintiru I. et al., J. Appl. Phys., 2007, 102(4), 043709[Crossref]
  • [26] Lin C.-C. et al., Chemical Physics Letters, 2005, 404, 30
  • [27] Irzh A., Langmuir, 2010, 26(8), 5976[Crossref]
  • [28] Chang K.-M. et al., Thin Solid Films, 2011, 519, 5114
  • [29] Samukawa S.et al., J. Phys. D: Appl. Phys., 2012, 45, 253001
  • [30] Foest R. et al., Contrib. Plasma Phys., 2007, 47, 119
  • [31] Erikson L., Louer D., Werner P.E., J. Solid State Chem., 1989, 81, 9
  • [32] Staehlin W., Ostwald H.R., Acta Crystallographia, 1979, 26, 860[Crossref]
  • [33] Crist B.V., Handbook of Monochromatic Xps Spectra, vol. 2, Commercially Pure Binary Oxides, XPS International Inc., 754 Leona Lane, Mountain View, California, 94040, USA, 1999, 818-827
  • [34] Baltrusaitis J. et al., Phys. Chem. Chem. Phys., 2009, 11, 8295-8305 [Crossref]
Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.-psjd-doi-10_1515_chem-2015-0020
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