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Optica Applicata

Tytuł artykułu

Significant effect of oxygen atmosphere on the structure, optical and electrical properties of Ti-doped In2O3 transparent conductive thin films

Autorzy Dong, C. J.  Yu, W. X.  Xu, M.  Chen, C.  Song, Z. Y.  Li, L.  Wang, Y. D. 
Treść / Zawartość
Warianty tytułu
Języki publikacji EN
EN Titanium-doped indium oxide (In2O3) transparent conductive thin films were deposited on glass and sapphire (0001) substrates with/without oxygen atmosphere by DC magnetron sputtering at 300 °C. The content of titanium is estimated to be about 1.8 at.% using energy dispersive spectroscopy. The smooth surfaces were covered with more uniform octahedral grains. X-ray diffraction measurements indicated that the preferential growth orientation along the (400) plane for the sample grown without oxygen atmosphere shifts to (222) for the sample grown in the oxygen atmosphere. The average optical transmittance of the sample grown with the introduction of oxygen varies from 70% to 90% in the visible region, which corresponds well to the variation of carrier and mobility. Hence, both intermediate dopant and oxygen atmosphere will provide the optimum balance between carrier concentration and mobility leading to the best transport properties of Ti-doped In2O3 films.
Słowa kluczowe
EN transparent oxide   indium oxide   thin films   electrical properties   optical properties  
Wydawca Oficyna Wydawnicza Politechniki Wrocławskiej
Czasopismo Optica Applicata
Rocznik 2011
Tom Vol. 41, nr 3
Strony 765--775
Opis fizyczny Bibliogr. 29 poz.
autor Dong, C. J.
autor Yu, W. X.
autor Xu, M.
autor Chen, C.
autor Song, Z. Y.
autor Li, L.
autor Wang, Y. D.
  • Department of Materials Science, Jilin University, Changchun 130012, P.R. China
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