Modification of the 306 Edwards sputtering system for the reproducible fabrication of sensitive thin films

• Autorzy: Yoffe A. , Shelukhin V.
• Języki publikacji: EN

Abstrakty

EN

Modifications to the 306 Edwards sputtering system have been discussed for the production of sensitive thin films, specifically amorphous pyroelectric perovskite films. For technical reasons, it is not possible to produce high quality thin films using standard sputtering systems. Furthermore, additional problems arise with the reproducibility of the films. The authors found that in unmodified sputtering systems, a general problem is that independent adjusting of the pressure in the chamber and the gas flow during the sputtering is not possible. Additional problems were low accuracy of gas ratio measurements, and high temperature radiation during sputtering which made impossible keeping the temperature conditions during deposition. Modifications to a standard set-up have been proposed and its operation has been checked. As a test-case, SrTiO3 thin film samples were fabricated. Their high quality confirmed validity of the modifications.

Słowa kluczowe

EN

Edwards sputtering; thin film; vacuum system

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2010
• Tom: Vol. 28, No. 4
• Strony: 833--839
• Opis fizyczny: Bibliogr. 14 poz.

Twórcy

autor

Yoffe A.

autor

Shelukhin V.

• The Helen and Martin Kimmel Center for Nanoscale Science Weizmann Institute of Science PO Box 26, Rehovot Israel

Bibliografia

• [1] http://www.edwardsvacuum.com/Products/List.aspx?r=125, Edvards Limited (2010).
• [2] AKTHER H., BHUIYAN A.H., New J. Phys., 7 (2005), 135.
• [3] DAI N.V., THUAN N.C., HONG L.V., PHUC N.X., LEE Y.P., WOLF S.A., NAM D.N.H., Phys. Rev. B, 77 (2008), 132406.
• [4] http://microlab.berkeley.edu/labmanual/chap6/edwards.pdf (2010).
• [5] LYAHOVITSKAYA V., ZON I., FELDMAN Y., COHEN S.R., TAGANTSEV A.K., LUBOMIRSKY I., Adv. Mater., 15 (2003), 1826. Reproducible fabrication of sensitive thin films 839
• [6] LYAHOVITSKAYA V., FELDMAN Y., ZON I., WACHTEL E., GARTSMAN K., TAGANTSEV A.K., LUBOMIRSKY I., Phys. Rev. B, 71 (2005), 094205.
• [7] EHRE D., LYAHOVITSKAYA V., TAGANTSEV A.K., LUBOMIRSKY I., Adv. Mater, 19 (2007), 1515.
• [8] FRENKEL A.I., FELDMAN Y., LYAHOVITSKAYA V., WACHTEL E., LUBOMIRSKY I., Phys. Rev. B, 71 (2005), 024116.
• [9] EBRALIDZE I., LYAHOVITSKAYA V., ZON I., WACHTEL E., LUBOMIRSKY I., J. Mater. Chem., 15 (2005), 4258.
• [10] WEN X.-D., CAHILL T.J., GEROVAC N.M., BUCKNUM M.J., HOFFMANN R., Inorg. Chem., 49 (2010), 249.
• [11] SHIBUYA K., DITTMANN R., MI S., WASER R., Adv. Mater., 22 (2010), 411.
• [12] CRANDLES D.A., NICHOLAS B., DREHER C., HOMES C.C., MCCONNELL A.W., CLAYMANB P.,GONG W.H., GREEDAN J.E., Phys. Rev. B, 59 (1999), 12842.
• [13] CALVANI P., CAPIZZI M., DONATO F., LUPI S., MASELLI P., PESCHIAROLI D., Phys. Rev. B, 47 (1993), 8917.
• [14] YAN X.B., XIA Y.D., XU H.N., GAO X., LI H.T., LI R., YIN J., LIU Z.G., Appl. Phys. Lett., 97 (2010), 112101.