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http://yadda.icm.edu.pl:80/baztech/element/bwmeta1.element.baztech-7a208fb3-231e-4474-a885-7c8632be3c29

Czasopismo

Materials Science Poland

Tytuł artykułu

Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Autorzy Venkatesan, S.  Ramu, M. 
Treść / Zawartość http://www.materialsscience.pwr.wroc.pl/
Warianty tytułu
Języki publikacji EN
Abstrakty
EN This work investigates the influence of titanium thin films on the mechanical properties of AA 2024 substrates. The Scanning Electron Microscope (SEM) measurements confirm that the surface morphology of Ti thin film depends on controlled deposition rate and the energy-dispersive X-ray (EDX) result reveals the uniform dispersion of Ti coating over the sample. Increase in film thickness on the material surface is connected with improved hardness, superior adhesion and minimum surface roughness which makes the coated material more prominent for MEMS application. It is also found that the XRD patterns of the Ti thin films are characterized by hexagonal close packed (HCP) structure with (1 1 1) as the preferred crystallographic orientation for the film of a thickness of 154 μm coated on the substrate at temperature of 673 K.
Słowa kluczowe
EN titanium   thin films   sputtering   hardness   MEMS  
Wydawca Springer
Czasopismo Materials Science Poland
Rocznik 2016
Tom Vol. 34, No. 4
Strony 735--740
Opis fizyczny Bibliogr. 23 poz., rys., tab.
Twórcy
autor Venkatesan, S.
  • Department of Mechanical Engineering, N.G.P. Institute of Technology, Coimbatore-641048, Tamil Nadu, India, vnsvenkatesan@gmail.com
autor Ramu, M.
  • Department of Mechanical Engineering, PSG College of Technology, Coimbatore-641004, Tamil Nadu, India
Bibliografia
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Uwagi
Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą naukę (zadania 2017).
Kolekcja BazTech
Identyfikator YADDA bwmeta1.element.baztech-7a208fb3-231e-4474-a885-7c8632be3c29
Identyfikatory
DOI 10.1515/msp-2016-0099